Effect of Oxidation Time on Structural and Morphological Properties of Nickel Thin Films Synthesized by Electron Beam Evaporation Technique

Abstract

Nickel thin films were prepared with a simple electron beam evaporation technique. After deposition, the films were oxidized for 1 and 2 h at 4000 °C temperature. The oxidation effect on the structural and morphological properties is discussed. Glancing angle X-ray diffraction data indicated the cubic and hexagonal phase of the prepared samples with space group Fm-3m and P(0) respectively. The FESEM images confirmed the nanostructured surface with closely packed grains. EDX analysis confirmed the presence of constituent elements in the prepared samples. Raman spectroscopy was carried out to study the vibrational modes. The multi-phases found in XRD can extend the spectral range of nonlinear optical effects, making the material suitable for ultrafast photonics and laser applications.