Cumulative Effect of Post-Deposition Annealing and Elevated Substrate Temperature On Structural, Electrical, Optical Properties and Wettability  of RF-Sputtered ITO Thin Films. IJPAP [Internet]. 2026 May 26 [cited 2026 May 30];64(5):491-50. Available from: https://or.niscpr.res.in/index.php/IJPAP/article/view/27239