Impact of Source Contact Engineering on Memory Window Enhancement in PVDF/ZnO Ferroelectric Thin-Film Transistors. Indian Journal of Pure & Applied Physics (IJPAP), [S. l.], v. 64, n. 7, 2026. DOI: 10.56042/ijpap.v64i7.30439. Disponível em: https://or.niscpr.res.in/index.php/IJPAP/article/view/30439. Acesso em: 15 jul. 2026.