Cumulative Effect of Post-Deposition Annealing and Elevated Substrate Temperature On Structural, Electrical, Optical Properties and Wettability  of RF-Sputtered ITO Thin Films. Indian Journal of Pure & Applied Physics (IJPAP), [S. l.], v. 64, n. 5, p. 491–501, 2026. DOI: 10.56042/ijpap.v65i5.27239. Disponível em: https://or.niscpr.res.in/index.php/IJPAP/article/view/27239. Acesso em: 30 may. 2026.